Scanning type exposure apparatus, position control apparatus, and method therefor

摘要

In a scanning type exposure apparatus, throughput is increased by omitting an unnecessary scanning period for settling. The scanning type exposure apparatus includes an exposure unit for exposing a substrate by projecting a pattern by a strip of light, an exposure control unit which turns on and off the exposure operation by the exposure unit, a designation value generator for designating a chip to be scanned and exposed next and a scanning speed, a reference position generator for generating a reference position of the pattern and a reference position of the substrate in accordance with the designation, and a position controller for controlling the positions of the pattern and the substrate on the basis of the reference positions. The reference position generator obtains a settling time for each chip by referring to a table storing predetermined settling times between the pattern and the substrate corresponding to each chip on the substrate and scanning speeds, and generates the reference positions of the pattern and the substrate for each chip on the basis of the settling time when performing exposure operation.