发明名称 |
Silicon dioxide containing coating |
摘要 |
A silicon dioxide containing coating can be used for multi-layer hermetic coatings, interlayer dielectric coatings, and flat panel display coatings. The coating is formed by applying a coating composition comprising polysilastyrene to a substrate and heating the polysilastyrene in an oxidizing atmosphere.
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申请公布号 |
US5935638(A) |
申请公布日期 |
1999.08.10 |
申请号 |
US19980129765 |
申请日期 |
1998.08.06 |
申请人 |
DOW CORNING CORPORATION |
发明人 |
CHANDRA, GRISH;HALUSKA, LOREN ANDREW |
分类号 |
B05D5/00;B05D7/24;C09D183/16;H01L21/316;(IPC1-7):B05P5/12 |
主分类号 |
B05D5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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