| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate placing stand surface protecting board on which particles will not be generated, and a method for cleaning a processing chamber and the substrate placing stand by using this board at cleaning. SOLUTION: The cleaning side surface part of a substrate placing stand surface protecting board 27 or the entirety is formed of silicon carbide in which micro-cracks 4 is substantially non-existent, and this substrate placing stand surface protecting board 27 is set on a substrate placing stand 31, for example, a site 25 of the substrate placing stand 31 where a substrate should be installed. Thus, a cleaning processing for removing deposit 30 from surrounding parts 26 of the site 25 can be attained without generating particles from the protecting board 27.</p> |
