| 发明名称 |
Focus monitor for alternating phase shifted masks |
| 摘要 |
A focus monitor for establishing best focus of a lithographic system in semiconductor wafers. The focus monitor has a phase region having a first phase and a slot disposed within the phase region having a gap size indicative of a defocus level of the lithographic system.
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| 申请公布号 |
US5936738(A) |
申请公布日期 |
1999.08.10 |
| 申请号 |
US19980127741 |
申请日期 |
1998.08.03 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
LIEBMANN, LARS W.;FERGUSON, RICHARD A. |
| 分类号 |
G01B11/02;G03F1/00;G03F7/20;(IPC1-7):G01B11/00 |
主分类号 |
G01B11/02 |
| 代理机构 |
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代理人 |
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| 地址 |
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