METHOD OF SYNTHETIC DIAMOND ABLATION WITH AN OXYGEN PLASMA AND SYNTHETIC DIAMONDS ETCHED ACCORDINGLY
摘要
A method for ablating a synthetic diamond having a pitted surface includes applying a colloidal graphite to the surface of the diamond and subjecting it to an oxygen plasma so that preferably approximately 50 microns are removed from the surface of the synthetic diamond. The resulting surface of the diamond is virtually pit free. Preferably, the diamond is then mechanically lapped for finishing.
申请公布号
CA2175787(C)
申请公布日期
1999.08.10
申请号
CA19962175787
申请日期
1996.05.03
申请人
CHAKRABORTY, RABINDRA N.;REINHARD, DONNIE K.;GOLDMAN, PAUL D.;FERRECCHIA, MICHAEL J.
发明人
CHAKRABORTY, RABINDRA N.;REINHARD, DONNIE K.;GOLDMAN, PAUL D.;FERRECCHIA, MICHAEL J.