发明名称 MECHANICAL CHUCK TYPE PLANAR PART WASHING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To make it possible to install a chuck in proximity to a planar part without the interference with a cover for recovering a waste liquid by executing the holding and releasing of the planar part by rotation of a chuck pin around the central axis of the chuck pin as an axial center. SOLUTION: A wafer supporting section 200 comprises the chuck pin 201 with a gear 202, an outer ring 203, an inner ring 204 with a gear 205, a pin retainer 206, a coupling pin 207 and an outer ring hood 208. The chuck pin 201 is held by a groove inscribed on the inner side of the outer ring 203 and the outside surface of the inner ring 204. The gear 202 on the outer periphery of the chuck pin 201 and the gear 205 disposed on the outside surface of the inner ring 204 fit to each other. The chuck pin 201, therefore, makes rotation motion by the relative rotation of the outer ring 203 and the inner ring 204 and makes revolution motion accompanying the rotation of the outer ring 203. The peripheral part of a wafer 1 is consequently pressed by the inscribing of a V shape accompanying the swiveling of the chuck pin 201 and when the chuck pin swirls 90 deg., the wafer 1 is held by the chuck pin 201.</p>
申请公布号 JPH11216434(A) 申请公布日期 1999.08.10
申请号 JP19980018539 申请日期 1998.01.30
申请人 HITACHI LTD 发明人 TANAKA YUICHIRO;DAIROKU NORIYUKI;TAKAHARA YOICHI;SAEKI TOMONORI;AIUCHI SUSUMU
分类号 B08B11/02;B08B3/02;B23Q3/06;H01L21/304;(IPC1-7):B08B3/02 主分类号 B08B11/02
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