| 摘要 |
A ROM structure and its method of manufacture using separate parallel trench bit lines for increasing memory component density as well as using a diode as the fundamental memory unit, each diode having a junction formed inside a bit line with a forward biased voltage of about 0.4 V and a reverse biased voltage dependent upon the doping condition in an N- region. At a junction between a word line and a bit line, either an ON state or an OFF state diode memory unit is created depending on whether a contact opening in the insulating layer for connection between the two is formed or not. When a definite operating voltage is applied to the word line, the stored information bit in the diode memory unit can be read off from the bit line by sensing a cut-off or a conducting current representing previous program coding of the diode memory unit.
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