发明名称 SOLVENT FOR CLEANING AND REMOVING RESIST AND MANUFACTURE OF DEVICE FOR FORMING ELECTRONIC PARTS
摘要 PROBLEM TO BE SOLVED: To provide the solvent for cleaning and removing the resist superior in resist dissolving power and free from toxicity and high in operation safety and capable of smoothing the edge parts of the resist and rendering film thickness constant and good in dissolving power also for a reflection preventing film component, and to provide the method for manufacturing the device for forming the electronic parts. SOLUTION: The solvent for rinsing and removing the resist and the reflection preventing film contains (a) propylene glycolalkyl ether, (b) a 1-7C monoketone, and (c) lactams or lactones. The resist or the reflection preventing film is formed by coating the surface of a substrate by using this solvent and a spinner, and the unnecessary resist and the reflection preventing film attached to the reverse side and the edge parts of the substrate are removed with this solvent in advance, and then subjected to a drying process.
申请公布号 JPH11218933(A) 申请公布日期 1999.08.10
申请号 JP19980019510 申请日期 1998.01.30
申请人 FUJI FILM OLIN KK 发明人 SUGAYA SATORU;IGUCHI NAOYA;AKUTAGAWA YUMISHI
分类号 G03F7/32;G03F7/40;H01L21/027;(IPC1-7):G03F7/32 主分类号 G03F7/32
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