| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing X-ray mask blank by which a sputtered film in which low stresses and uniform intra-surface stresses are set up can be obtained, and accordingly, an X-ray mask having extremely high positional accuracy can be manufactured. SOLUTION: A method for manufacturing X-ray mask blank includes a process for forming a sputtered film containing at least a film composed of an X-ray absorbing material on a substrate. In the sputtered film forming process, the sputtered film is formed, while the temperature of the substrate on which the sputtered film is formed is measured and adjusted at the same time. The measurement of the substrate temperature during the sputtering, for example, is performed by a phosphor sensor 21 installed to the rear surface side of a substrate 30. |
