发明名称 |
Fabrication of etched features |
摘要 |
Disclosed is a method of fabricating electronic components on a semiconductor substrate by etching features in the substrate through a mask including apertures which are separated by a prescribed spacing. Etching is continued until the etched features merge into a single channel. This technique can be used to form channels having nonuniform shapes, or could be used to monitor the end point of an etching operation.
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申请公布号 |
US5935451(A) |
申请公布日期 |
1999.08.10 |
申请号 |
US19970806229 |
申请日期 |
1997.02.24 |
申请人 |
LUCENT TECHNOLOGIES INC. |
发明人 |
DAUTARTAS, MINDAUGAS FERNAND;WONG, YIU-HUEN |
分类号 |
H01L21/306;G02B6/36;G02B6/42;H01L21/308;H01L31/12;H01S5/00;H01S5/022;(IPC1-7):H01L21/302 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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