Close tolerance, low flow, flow control device using etched discs

摘要

A flow control device (FCD) controls low flow rate fluid flow to within closely tolerated and consistently maintained limits by way of improved stacked disc technology. Stacking face to face of similar disc configurations generates novel enhanced etched disc stacks allowing course and fine flow adjustments, maintenance of cleanliness, resistance to flow degradation, improved structural strength and the ability to make real time flow adjustments during mission life. A stainless/copper sandwiched embodiment seals face to face leakage faster than known means for controlling etched disc face to face seal designs.