发明名称 Method for polishing thin plate and apparatus for polishing
摘要 A method and an apparatus, for polishing a thin plate. The method comprises the steps of: rotating a holding plate on one surface of which the thin plate is held to adhere; and bringing the thin plate held on the rotating holding plate into contact with a polishing pad mounted on a surface of a rotating turn table, to polish the thin plate. The step of polishing the one surface of the holding plate is carried out by using the polishing pad for polishing the thin plate before the thin plate is held to adhere on the one surface of the holding plate.
申请公布号 US5934981(A) 申请公布日期 1999.08.10
申请号 US19970972680 申请日期 1997.11.18
申请人 SHIN-ETSU HANDOTAI CO., LTD. 发明人 TANAKA, KOICHI;TSUCHIYA, TOSHIHIRO;MORITA, KOJI;TAKAKU, TSUTOMU
分类号 B24B37/04;H01L21/304;(IPC1-7):B24B1/00 主分类号 B24B37/04
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