发明名称 METHOD AND APPARATUS FOR INSPECTING PATTERN DEFECT
摘要 <p>PROBLEM TO BE SOLVED: To determine an appropriate threshold value at a desired inspection point on a TFT array substrate while preventing fluctuation of defect detection criterion due to lowering of illumination at the time of measurement and to sort the detected defects automatically. SOLUTION: A substrate to be inspected is selected arbitrarily and layer to be inspected, e.g. two layers of a Cs branch part 22 and a gate part 23, are selected. Gray level of 100-500 points is then measured for each layer and a mean gray level is calculated along with a standard deviation. A sensitivity graph has an abscissa of normal part gray level and an ordinate of threshold value. Values of 1-3 times of the standard deviation of each layer for the mean gray level at the Cs branch part 22 and the gate part 23 are inputted as parameters. Two layers, of the Cs branch part 22 and the gate part 23 and a sensitivity graph on the boundary thereof can be drawn and the threshold value of two layer having high detection priority can be determined.</p>
申请公布号 JPH11211614(A) 申请公布日期 1999.08.06
申请号 JP19980018677 申请日期 1998.01.30
申请人 ADVANCED DISPLAY INC 发明人 YASUDA HARUMI;ISHIO NORIAKI
分类号 G01M11/00;G02F1/13;G02F1/136;G02F1/1368;(IPC1-7):G01M11/00 主分类号 G01M11/00
代理机构 代理人
主权项
地址