| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate observation apparatus by which the position of a defect, on a substrate, detected by its macroscopic observation can be specified quickly. SOLUTION: A substrate observation apparatus is constituted so as to be provided with a stage part ST on which a substrate 1 is placed, a macroscopic observation part 6 which observes the substrate 1 macroscopically and the like. In this case, the observation apparatus is provided with spot-light irradiation light sources LS, FB which shine spot light 11 at the substrate 1, a spot- light movement part FBM by which the spot light 11 is moved from a reference irradiation part 18 to the position of a defect part 7 observed in its macroscopic observation and a coordinate-position-data computing part CP in which coordinate-position data on the defect part 7 on the substrate 1 is found on the basis of the movement amountθof the spot light 11.
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