发明名称 METHOD FOR DEPOSITION OF FILM SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for deposition of a film substrate which makes it possible to form a water molecule impermeable layer on a laminate consisting of the film substrate having a hydrous and water molecule permeable later and a later by suppressing the occurrence of warpage in this laminate and is capable of executing deposition with overall reduced warpage. SOLUTION: The laminate 13 is held at a temp. above the b. p. of the water as a treatment before the deposition of the impermeable layer in the method for deposition of the film substrate which deposits the water molecule impermeable layer on the laminate 13 constituted by forming an org. layer 12 having the hydrous and water molecule permeable properties on one surface of the plastic film substrate 11 having the hydrous and water molecule permeable properties. If the laminate consisting of the film substrate having the hydrous and water molecule permeable properties and the layer is held at the temp. above the b. p. of the water and is previously dehydrated until the shrinkage of the laminate stabilizes, the difference in the shrinkage between the film substrate and the layer is made smaller by as much as the decreased component of the moisture at the time of depositing the impermeable layer on the laminate. The deposition of the impermeable layer is made possible and the overall warpage of the product is minimized while the occurrence of the warpage of the laminate is suppressed.
申请公布号 JPH11213443(A) 申请公布日期 1999.08.06
申请号 JP19980015532 申请日期 1998.01.28
申请人 RICOH CO LTD 发明人 SUGAWARA TOMOAKI;SATO TATSUYA
分类号 B32B7/02;B32B33/00;B32B38/00;G11B5/73;G11B7/24 主分类号 B32B7/02
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