发明名称 PATTERN FORMING METHOD AND APPARATUS THEREFOR
摘要 PROBLEM TO BE SOLVED: To correct the line width difference dependent on the coarseness and denseness of micropatterns by automatically arranging a phase shifter with high efficiency without a discrepancy. SOLUTION: The shapes and phases of plural phase shift patterns are determined in accordance with the positional relation of plural micropatterns and the phases thereof are so determined that the phase difference on both sides of the micropatterns attains 180 deg.. For example, the plural micropatterns are extracted from already designed element shape patterns and the unit pattern of a prescribed width or above necessary for negating the interference of light on both sides of the transverse direction of the fine lines of the micropatterns is arranged on each of the plural extracted micropatterns (ST1). The plural phase shift patterns are formed by OR processing, etc., of the unit pattern (ST2). If the phase discrepancy at which the phase difference attains 0 deg. occurs, the phase discrepancy is eliminated by a pattern change, such as shift pattern division, after layout compression, etc., are carried out according to need.
申请公布号 JPH11212247(A) 申请公布日期 1999.08.06
申请号 JP19980011334 申请日期 1998.01.23
申请人 SONY CORP 发明人 ONUMA EIJU
分类号 G03C1/005;G03F1/30;G03F1/34;G03F1/36;G03F1/68;G03F1/70;H01L21/027 主分类号 G03C1/005
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