发明名称 SUBSTRATE TRANSPORTING APPARATUS AND APPARATUS FOR MEASURING PATTERN POSITION, USING THE SAME
摘要 PROBLEM TO BE SOLVED: To avoid dimension variation due to the thermal change of a substrate when pattern information (coordinate positions, etc.), are detected on the substrate. SOLUTION: For a substrate transport apparatus a substrate housing unit 30 for housing a substrate, stage 10 mounting the substrate, and transport unit 20 for transporting the substrate housed in the substrate housing unit 30 along specified transport path 21 are provided. A temp. controller 40 for controlling the temp. in the substrate housing unit 30, based on the temp. near the stage 10 is provided to adjust so that the temp. near the stage 10 is equal to that of a gas in the housing unit 30. Hence the substrate transported to the stage 10 is at the same temp. as that near the stage and the dimension variation due to thermal change never occurs.
申请公布号 JPH11214475(A) 申请公布日期 1999.08.06
申请号 JP19980021610 申请日期 1998.01.20
申请人 NIKON CORP 发明人 IWASAKI MASAYA
分类号 G01B11/00;G01B21/00;H01L21/673;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 G01B11/00
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