MOISTURIZING PERSONAL CLEANSING COMPOSITIONS WITH IMPROVED LIPID DEPOSITION

摘要

The present invention relates to moisturizing personal cleansing compositions comprising a lathering surfactant and a lipophilic skin moisturizing agent wherein the moisturizing personal cleansing composition has a Lipid Deposition Value of greater than or equal to about 25 micrograms/square centimeter. The invention further relates to moisturizing personal cleansing composition comprising from about 85 % to about 95 % of a neat cleansing lotion comprising from about 0.5 % to about 30 % by weight of the neat cleansing lotion, of a lathering surfactant; from about 0.5 % to about 33 % by weight of the neat cleansing lotion, of a lipophilic skin moisturizing agent; from about 0.1 % to about 2 % by weight of the neat cleansing lotion, of a stabilizer; and from about 35 % to about 90 % by weight of the neat cleansing lotion, of water; and from about 3 % to about 15 % of a hydrocarbon propellant wherein the moisturizing personal cleansing composition has a Deposition Value of greater than or equal to about 25 micrograms/square centimeter.