发明名称 APPARATUS AND METHOD FOR EMBOSSING AND PRINTING ELONGATED SUBSTRATES
摘要 <p>An apparatus and method for printing and embossing elongated substrates, provide for both length and position registration with respect to the printed and embossed patterns. An ink pattern to embossed pattern error is corrected by stretching or relaxing the substrate (110) between printing assembly (102) and embossing assembly (106).</p>
申请公布号 WO1999038679(A1) 申请公布日期 1999.08.05
申请号 US1999001957 申请日期 1999.01.29
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