发明名称 |
Charged beam lithography apparatus and method thereof |
摘要 |
A charged beam lithography apparatus simultaneously uses multiple charged beams to irradiate a workpiece. In specific embodiments, collimators are employed to assist in aligning the multiple charged beams by eliminating "noise" from reflections of other beams. Each collimator is positioned to correspond with respective of the charged beams and detectors for detecting reflected particles from the charged beams. The particles are reflected from particular marks used in the alignment process. Each collimator helps to prevent particles from adjacent charged beams from entering a detector that corresponds with a specific charged beam.
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申请公布号 |
US5933211(A) |
申请公布日期 |
1999.08.03 |
申请号 |
US19970917212 |
申请日期 |
1997.08.25 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
NAKASUGI, TETSURO;WATANABE, YUMI |
分类号 |
G21K5/04;G03F7/20;H01J37/04;H01J37/304;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):G03B27/00;G01N23/00 |
主分类号 |
G21K5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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