发明名称 PHOTOSENSITIVE POLYIMIDE PRECURSOR SOLUTION, POLYIMIDE COATING FILM OR POLYIMIDE FILM OBTAINED THEREFROM, AND PRODUCTION THEREOF
摘要 PROBLEM TO BE SOLVED: To obtain a solution having a high concentration and low viscosity and giving a coating film excellent in heat resistance by dissolving a solute comprising a salt of a diamine with a compound having a photosensitive group and a sensitizer or a photoinitiator in a solvent. SOLUTION: A salt of an amino-containing compound represented by formula I with a compound represented by formula II and a photoinitiator such as a Michler's ketone are dissolved in a solvent such as N,N-dimethylformamide to obtain a polyimide precursor solution having a concentration of 30 wt.% or above and a viscosity of 100 P or above. A polyimide precursor solution prepared by replacing 0-20 mol.% of the compound of formula II by a carboxylic or dicarboxylic anhydride of formula III or IV is applied to a substrate to form a coating film, the film is irradiated with ultraviolet rays through a negative mask, after the unexposed area is dissolved in a developer, the film is imidized by heating to obtain a polyimide film. In the formula, R is a divalent aromatic residue containing a six-membered carbocylic ring; and R" is H or a 1-5C alkyl; and R"' is hydroxyl or a group composed of an ion having a photosensitive group and O bonded thereto.
申请公布号 JPH11209609(A) 申请公布日期 1999.08.03
申请号 JP19980012840 申请日期 1998.01.26
申请人 UNITIKA LTD 发明人 SETO KEITARO;KOMATSUBARA TSUTOMU;ECHIGO YOSHIAKI
分类号 B29C41/12;B29K77/00;B29L7/00;C08J5/18;C08L79/08;(IPC1-7):C08L79/08 主分类号 B29C41/12
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