RTP booster to semiconductor device anneal

摘要

A method is provided for increasing the electrical activation of dopants in a semiconductor device using rapid thermal processing (RTP). An aspect of the invention includes forming a gate on a semiconductor body (12), such as a substrate (14), and implanting a dopant (28) into the semiconductor body (12) proximate the gate. The dopant (28) is partially activated using a furnace. The dopant (28) is further activated using RTP. The activation of the dopant (28) through RTP in addition to the furnace annealing allows almost complete activation of the dopant while maintaining acceptable channel depths.