Template mask for assisting in optical inspection of oxidation induced stacking fault (OISF)

摘要

A method for optically inspecting a semiconductor substrate for defects such as oxidation induced stacking faults, and a template mask which assists in practicing the optical inspection method. There is first provided a semiconductor substrate which has a surface to be inspected for defects such as oxidation induced stacking faults. Aligned then upon the surface of the semiconductor substrate to be inspected for defects such as oxidation induced stacking faults is a template mask. The template mask has a minimum of one aperture which leaves exposed a portion of the surface of the semiconductor substrate to be inspected for defects such as oxidation induced stacking faults. Finally, there is inspected optically the portion of the surface of the semiconductor substrate exposed through the aperture.