发明名称 Thin film semiconductor device for active matrix panel
摘要 A thin film semiconductor device comprising a thin film transistor (TFT) having a thin film semiconductor on an insulation substrate to define an element region, and a hygroscopic interlayer dielectric which covers the element. A hydrogenation treatment which comprises the interlayer dielectric provided thereon a cap film for blocking hydrogen diffusion, so that water entrapped by the interlayer dielectric may be decomposed to generate hydrogen which is allowed to diffuse into the thin film transistor provided on the side opposite to that of the cap film.
申请公布号 US5932484(A) 申请公布日期 1999.08.03
申请号 US19970950933 申请日期 1997.10.15
申请人 SONY CORPORATION 发明人 IWANAGA, TOSHIHIKO;INO, MASUMITSU;KAISE, KIKUO;URAZONO, TAKENOBU;IKEDA, HIROYUKI
分类号 H01L21/30;H01L21/336;H01L29/786;(IPC1-7):H01L21/331;H01L21/00 主分类号 H01L21/30
代理机构 代理人
主权项
地址