发明名称 SEMICONDUCTOR MEMORY DEVICE WITH TRIPLE METAL LAYER
摘要 A semiconductor memory device formed using a triple metal process to minimize the chip area required to define such a circuit. The semiconductor memory device having a memory cell array and a peripheral circuit for reading and writing data from and into a memory cell. The peripheral circuit includes a circuit layer, a first servicing circuit, a second servicing circuit and a third servicing circuit. The circuit layer, such as a decoder or buffer, defines a peripheral circuit layer area of a semiconductor chip. The first servicing circuit, preferably input/output lines, is defined vertically relative to said peripheral circuit layer area in a first metal layer located in said semiconductor chip. The second servicing circuit, preferably signal bussing lines, is defined vertically relative to said first servicing circuit in a second metal layer located in said semiconductor chip. Finally, the third servicing circuit, such as a power line layer, is defined in a third meal layer vertically relative to said second servicing circuit.
申请公布号 KR100211768(B1) 申请公布日期 1999.08.02
申请号 KR19960062410 申请日期 1996.12.06
申请人 SAMSUNG ELECTRONICS CO, LTD. 发明人 CHUN, JUNG-YOUNG
分类号 G11C11/41;G11C5/02;G11C11/401;H01L21/28;H01L21/3205;H01L21/82;H01L21/8242;H01L23/52;H01L23/528;H01L27/108;(IPC1-7):H01L21/28 主分类号 G11C11/41
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