Sputter cathode target casting apparatus has a two-layer base plate

摘要

A sputter target casting frame is positioned on a base plate comprising an upper steel layer with heating rod insertion holes and a lower aluminum or copper layer with grooves or recesses for cooling tubes. Apparatus for casting sputter cathode targets comprises a frame positioned on a base plate which consists of an upper steel layer in intimate contact with a lower aluminum or copper layer, the upper layer having holes extending parallel to its plane for accommodating heating rods and the lower layer having grooves or recesses extending parallel to its plane for accommodating cooling tubes.