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发明名称
Verdünnungsmittelzusammensetzung zum Abwaschen von unnötigem Photoresist auf einem Wafer
摘要
申请公布号
DE19720413(C2)
申请公布日期
1999.07.29
申请号
DE19971020413
申请日期
1997.05.15
申请人
SAMSUNG ELECTRONICS CO. LTD., SUWON, KR
发明人
CHON, SANG-MOON, SONGNAM, KYUNGKI, KR;LEE, BOO-SUP, SEOUL/SOUL, KR;KIM, SUNG-IL, SUWON, KYUNGKI, KR;GIL, JUN-ING, SONGNAM, KYUNGKI, KR;JUN, PIL-KWON, SEOUL/SOUL, KR;JUN, ME-SUK, SEOUL/SOUL, KR
分类号
G03F7/38;C11D7/26;C11D7/50;G03F7/16;G03F7/32;G03F7/42;H01L21/027;H01L21/306;(IPC1-7):G03F7/42
主分类号
G03F7/38
代理机构
代理人
主权项
地址
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