Optical projection system for manufacturing semiconductor components

摘要

The system contains a first positive lens group, a second negative lens group, a third positive lens group, a fourth negative lens group with first aspherical surface, and a first positive lens group with an aperture limiter (AS). The projection system is so designed that paraxial beams pass from image to object in parallel to the optical axis and intersect the latter at a point between the fourth and fifth lens group. One of the two groups has a second aspherical surface. The fifth group has a third aspherical surface, and a specified condition is that independent claims specify the illumination system. Independent claims are included for an optical exposure device, and method for manufacturing components.