发明名称 |
Chemically amplified resist composition and method of creating a patterned resist using electron beam |
摘要 |
<p>The present invention relates to chemically amplified resists and resist systems wherein some of the polar functional groups of the aqueous base soluble polymer or copolymers are protected with a cyclic aliphatic ketal protecting group such as methoxycyclohexanyl. The resists and the resist systems of the present invention containing the new protecting group have improved shelf-life and vacuum stability as compared to the prior art resists. Thus, the resists of the present invention are highly useful in e-beam lithographic applications.</p> |
申请公布号 |
EP0932082(A2) |
申请公布日期 |
1999.07.28 |
申请号 |
EP19990300525 |
申请日期 |
1999.01.25 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BUCCHIGNANO, JAMES J.;HUANG, WU-SONG;KATNANI, AHMAD D.;LEE, KIM Y.;MOREAU, WAYNE M.;PETRILLO, KAREN E. |
分类号 |
H01L21/027;G03F7/004;G03F7/039;(IPC1-7):G03F7/039 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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