发明名称 POSITIONING DEVICE AND LASER BEAM MACHINE
摘要 PROBLEM TO BE SOLVED: To provide a positioning device capable of exact and rapid automatic focussing in spite of dispersion of a film thickness and a laser beam machine equipped with this positioning device. SOLUTION: Provided are a vertical incident type position detector system 17 to detect positional information concerning vertical direction of a semiconductor device 12 by projecting a measuring light beam vertically upon a semiconductor device 12 as an 'object' and an inclined incident type position detector system 18 to detect positional information concerning the vertical direction of the semiconductor device 12 by projecting a measuring light beam in an inclined direction upon the surface of the semiconductor device 12. That is a positioning device equipped with a compensation amount detecting system 26 to detect a deviation of the positional information of the semiconductor device 12 detected by an inclined incident type position detector system 18 from the positional information of semiconductor 12 detected by the vertical incident type position detector system 17.
申请公布号 JPH11197865(A) 申请公布日期 1999.07.27
申请号 JP19980021404 申请日期 1998.01.19
申请人 NIKON CORP 发明人 YOSHIKAWA TORU
分类号 B23K26/00;B23K26/02;B23K26/03;B23K26/10;H01L21/82;H01S3/00;(IPC1-7):B23K26/02 主分类号 B23K26/00
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