| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating application method and device which suppress the fluctuation of the film pressure of a liquid applied on a cylindrical substrate and suppress unequal coating by stabilizing the behavior of the coating liquid in the slit of the coating applicator and improve coating applicability, eliminate bead breakage and uneven film thickness, and provide the excellent coating application performance strong to the pulsation change of the fed liquid by preventing the outflow of the aggregate of the pigments in the coating liquid. SOLUTION: This coating method consists in distributing the coating liquid supplied through a supply port 48 from outside to an coating liquid reserving chamber 44, supplying the distributed coating liquid through the slit 43 toward the inner peripheral surface side and applying the coating liquid on the outer peripheral surface of the relatively moving cylindrical substrate 1. The absolute pressure P in the coating liquid reserving chamber 44 satisfies 3×10<4> <=P<3×10<6> (mmH2 O). The coating liquid supplied from the supply port 48 is supplied to the lowest part of the coating liquid in the coating liquid reserving chamber 44 having a sectional shape formed by curved lines. The coating liquid in the coating liquid reserving chamber 44 is forcibly fed through the slit 43 toward the inner peripheral surface side and is applied on the outer peripheral surface of the relatively moving cylindrical substrate 1.
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