发明名称 |
Trimethyl(ethylcyclopentadienyl)platinum, process for producing the same and process for producing platinum-containing films with the use of the same |
摘要 |
A Pt compound which is in the form of a liquid at room temperature for producing Pt films usable as electrode films in semiconductor devices by the CVD method; a process for producing the compound; and a process for producing films with the use of the same. A novel compound trimethyl(ethylcyclopentadienyl)platinum (C2H5C5H4)Pt(CH3)3 is in the form of a liquid at room temperature and shows a sufficient vapor pressure at around 35 DEG C. Thus, it can be quantitatively supplied by gas bubbling or with the use of a liquid mass flow controller as a feedstock in the CVD method and thermally decomposed on a substrate at 150 DEG C. in a hydrogen atmosphere to give pure Pt films. This compound can be produced at a high yield by reacting iodotrimethylplatinum with sodium ethylcyclopentadienide in a solvent.
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申请公布号 |
US5929267(A) |
申请公布日期 |
1999.07.27 |
申请号 |
US19990251752 |
申请日期 |
1999.02.17 |
申请人 |
KABUSHIKIKAISHA KOJUNDOKAGAKU KENKYUSHO |
发明人 |
KADOKURA, HIDEKIMI |
分类号 |
C07F15/00;C07F17/02;C23C16/18;(IPC1-7):C07F17/02;C23C16/00 |
主分类号 |
C07F15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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