发明名称 Photoresist compositions
摘要 Polymers having an average molecular weight Mw (weight average) of 5,000 to 1,000,000 (measured by gel permeation chromatography), comprising structural repeating units of the formulae I-IV: in which R1, R2, R3 and R4 independently of one another are hydrogen, methyl or halogen, R5 and R6 independently of one another are C1-C6alkyl, R7, R8, R9 and R10 independently of one another are hydrogen, C1-C4alkyl, C1-C4alkoxy or halogen, and w, x, y and z are numbers equal to or greater than 1, with the provision that the quotient which is obtainable from the sum of the structural units having protecting groups divided by the sum of all of the structural units present, obeys the condition 0.10</=Q</=0.50, are suitable as binders for DUV photoresists of high processing stability and flow resistance.
申请公布号 US5928818(A) 申请公布日期 1999.07.27
申请号 US19970806590 申请日期 1997.02.26
申请人 OLIN MICROELECTRONIC CHEMICALS, INC. 发明人 MERTESDORF, CARL-LORENZ;SCHACHT, HANS-THOMAS;MUENZEL, NORBERT;FALCIGNO, PASQUALE ALFRED
分类号 C08F8/00;C08F8/04;C08F12/00;C08F16/02;C08F16/14;C08F16/16;C08F112/04;C08F212/14;C08F216/10;C08F216/14;C08F216/16;G03F7/00;G03F7/004;G03F7/033;G03F7/039;H01L21/027;H05K3/00;H05K3/28;(IPC1-7):G03F7/004 主分类号 C08F8/00
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