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发明名称
Triamine positive photoresist stripping composition and prebaking process
摘要
申请公布号
HK1012166(A1)
申请公布日期
1999.07.23
申请号
HK19980113026
申请日期
1998.12.09
申请人
EKC TECHNOLOGY, INC.
发明人
WAI MUN LEE
分类号
C11D7/32;G03C11/00;G03F7/00;G03F7/42;H01L21/027;(IPC1-7):G03F
主分类号
C11D7/32
代理机构
代理人
主权项
地址
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