| 发明名称 |
METHOD AND APPARATUS FOR IMPROVED CHEMICAL VAPOR DEPOSITION PROCESSES USING TUNABLE TEMPERATURE CONTROLLED GAS INJECTORS |
| 摘要 |
A method and apparatus for improved CVD process results uses tunable temperature controlled gas injectors. The design is suited to single wafer and multiple wafer CVD process chambers.
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| 申请公布号 |
WO9936588(A1) |
申请公布日期 |
1999.07.22 |
| 申请号 |
WO1999US00874 |
申请日期 |
1999.01.14 |
| 申请人 |
TORREX EQUIPMENT CORPORATION |
发明人 |
COOK, ROBERT, C.;BRORS, DANIEL, L. |
| 分类号 |
C23C16/44;C23C16/455;C30B25/14;H01L21/00;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/44 |
| 代理机构 |
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