发明名称 VERTICAL IGBT WITH AN SOI STRUCTURE
摘要 SOI-IGBT with a first conductive type channel area (13), at least one second conductive type cell area (10) and at least one first conductive type intermediate area (15) defining the IGBT. The channel area (13), cell area (10) and intermediate area (15) are arranged in an insulating layer (5) on a first conductive type semi-conductor body (1). The channel area (13), cell area (10) and intermediate area (15) are connected to the semiconductor body (1) by means of recesses (6, 7, 8) in the insulating layer (5).
申请公布号 WO9936963(A1) 申请公布日期 1999.07.22
申请号 WO1998DE03590 申请日期 1998.12.07
申请人 SIEMENS AKTIENGESELLSCHAFT;TIHANYI, JENOE 发明人 TIHANYI, JENOE
分类号 H01L21/8238;H01L27/092;H01L29/04;H01L29/06;H01L29/40;H01L29/41;H01L29/739;H01L29/78 主分类号 H01L21/8238
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