| 发明名称 |
METHOD OF CLEANING A CVD COLD-WALL CHAMBER AND EXHAUST LINES |
| 摘要 |
A method of cleaning post deposition deposits from a processing chamber by providing a chlorine gas (Cl2), forming chlorine radicals and reacting the chlorine radicals with the deposits. |
| 申请公布号 |
WO9936589(A1) |
申请公布日期 |
1999.07.22 |
| 申请号 |
WO1998US24124 |
申请日期 |
1998.11.12 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
COMITA, PAUL, B.;FORSTNER, HALI, J., L.;RANGANATHAN, REKHA |
| 分类号 |
B01J3/00;B01J19/00;C23C16/44;H01L21/205 |
主分类号 |
B01J3/00 |
| 代理机构 |
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