发明名称 PROCESS FOR THE FORMATION OF OXIDE CERAMIC THIN FILM
摘要 <p>A process for the formation of an oxide ceramic thin film, which permits the control of film oxygen content and can give a film reduced in oxygen deficiency. The process is characterized in that the step of forming an amorphous thin film, the step of heating the thin film to crystallize it or the step of heat-treating the crystallized film is conducted in a moisture-containing atmosphere.</p>
申请公布号 WO1999036353(P1) 申请公布日期 1999.07.22
申请号 JP1999000167 申请日期 1999.01.19
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