EXPOSURE SYSTEM, EXPOSURE APPARATUS, AND COATING DEVELOPING EXPOSURE APPARATUS

摘要

An exposure system characterized in that the system comprises a first unit having a first device for transferring the image of a pattern of a mask onto a wafer, a second unit having a second device having a function different from that of the first device, and a connection unit connecting the first unit to the second unit, and that the inner pressure of a connection section is lower than those of the first and second units and higher than the ambient pressure of the connection unit.