发明名称 A HIGH VOLTAGE TRANSISTOR HAVING A FIELD OXIDE GATE REGION
摘要 A high voltage transistor, formed in a bulk semiconductor material (200), has a gate region (230) defined by a relatively thick field oxide (205) and a source (220) and drain (225) on opposite sides of the field oxide (205).
申请公布号 WO9936965(A1) 申请公布日期 1999.07.22
申请号 WO1999US00591 申请日期 1999.01.12
申请人 LSI LOGIC CORPORATION 发明人 RANDAZZO, TODD, A.
分类号 H01L21/336;H01L21/8234;H01L21/8238;H01L27/088;H01L29/423 主分类号 H01L21/336
代理机构 代理人
主权项
地址