发明名称 ELECTRON BEAM PROFILE MEASUREMENT METHOD AND SYSTEM
摘要 <p>In a method of measuring electron beam profile in an electronic display device (16), a matrix of video dots (24) is displayed on a display screen of the electronic display device, each of the video dots being comprised of a group (27) of phosphor dots (28) illuminated by an electron beam. An image of a plurality of groups of illuminated phosphor dots forming the video dots within a field of view is then taken. The average horizontal and vertical distances of the video dots within the field of view is determined and the groups of illuminated phosphor dots forming the video dots in the field of view that are captured in the image are superimposed based on the average horizontal and vertical distances of the video dots generally to average and fill in discontinuities between phosphor dots in the groups and thereby generate an overlay image (40) of the electron beam. Cross sections of the overlay image can be approximated and at least one intensity profile of the electron beam calculated. Overlay images (40) of each color electron beam can also be captured simultaneously and a convergence error calculated.</p>
申请公布号 WO1999036933(A1) 申请公布日期 1999.07.22
申请号 CA1999000009 申请日期 1999.01.13
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