发明名称 A HIGH VOLTAGE TRANSISTOR HAVING A FIELD OXIDE GATE REGION
摘要 <p>A high voltage transistor, formed in a bulk semiconductor material (200), has a gate region (230) defined by a relatively thick field oxide (205) and a source (220) and drain (225) on opposite sides of the field oxide (205).</p>
申请公布号 WO1999036965(A1) 申请公布日期 1999.07.22
申请号 US1999000591 申请日期 1999.01.12
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