| 摘要 |
PROBLEM TO BE SOLVED: To suppress generation of scum and to obtain excellent developability, a good side rove margin and an exposure margin by incorporating a specified phenolic compd., a novolak resin obtd. from a mixture of m-cresol and the specified phenolic compd. and a specified ester compd. SOLUTION: This resist compsn. contains a phenolic compd. of formula I, an alkali-soluble novolak resin obtd. by condensing a phenolic compd. mixture consisting of 50-90 mol.% m-cresol based on the total amt. of the phenolic compds. and a phenolic compd. of formula II with an aldehyde compd. and a 1,2-naphthoquinonediazidosulfonic ester compd. of a phenolic compd. of formula III. In the formula I, R is H, alkyl, alkoxy or hydroxyl. In the formula II, (n) is an integer of 2 or 3. In the formula III, X1 and X2 are each H, alkyl, alkoxy or hydroxyl and Y1 -Y8 are each H or alkyl. |
