发明名称 INTEGRATED CIRCUIT DEVICE HAVING AT LEAST ONE CAPACITOR AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To provide an integrated circuit device having at least one capacitor, which can be manufactured with a very high mounting density. SOLUTION: A capacitor is provided on a first substrate 1, and a circuit device having contacts K is provided on a second substrate 2. The first and the second substrates 1 and 2 are jointed together so that the contacts K are located adjacent to the capacitor. When part capacitors are provided on the first substrate 1 and a contact surface KF of the contact K is set to have such a size, that the contacts K necessarily defining the capacitor are contacted with at least one of the part capacitors at the time of jointing the substrates 1 and 2, the jointing of the first and the second substrates 1 and 2 can be carried out substantially without adjustment. The capacitor may include a plurality of part capacitors to thereby become a very large capacitance. The circuit device is set particularly to be a DRAM cell device.
申请公布号 JPH11195769(A) 申请公布日期 1999.07.21
申请号 JP19980298958 申请日期 1998.10.20
申请人 SIEMENS AG 发明人 KLOSE HELMUT;LEHMANN VOLKER;REISINGER HANS DR;HOENLEIN WOLFGANG
分类号 H01L27/04;H01L21/822;H01L21/8242;H01L27/108 主分类号 H01L27/04
代理机构 代理人
主权项
地址