PATTERN FORMING METHOD AND PHOTOSENSITIVE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To obtain a pattern by applicable to a lithographic process with good reproducibility by adopting an in-line system of from coating to development without stagnation. SOLUTION: The top of a substrate 11 is coated with a compsn. 12 contg. a compd. (a) (photo-acid generating agent) 13 which discharges acid when irradiated with chemical rays and a carboxyl group-contg. compd. (b) 14 which causes decarboxylation reaction and can be decomposed. The acid to discharge the photo-acid generating agent (a) in the exposed part by exposing a pattern is neutralized with a basic compd. (c) and the concn. of the free basic compd. (c) decreases. The free basic compd. (c) acts as a catalyst for a decarboxylation reaction of the carboxyl group-contg. compd. (b), the compd. (b) remains in the form in which it is readily soluble in a developer in the exposed part and the compd. (b) turns into a compd. (b') insoluble in the developer by decarboxylation reaction in the unexposed part. As the result, developed contrast between the exposed and unexposed parts is obtd. and the unexposed part remains on the substrate 11 after development and a positive image is obtained.