发明名称 Photosensitive composition
摘要 A photosensitive composition capable of producing a photosensitive lithographic printing plate having excellent developing property and press life in direct lithoprinting even if stored in an atmosphere having high temperature and humidity. The photosensitive composition comprising a diazo resin (a) wherein a counter anion is an inorganic acid anion or an aliphatic organic acid anion having 3 or less carbon atoms; a diazo resin (b) wherein a counter anion is an aliphatic or aromatic organic acid anion having 6 or more carbon atoms; and a polyurethane resin which is a reaction product of an isocyanate comprising 40 to 90 mol% of a diisocyanate represented by the general formula (I) defined hereinabove based on the amount of total isocyanate components with an alcohol comprising 30 to 90 mol% of a diol represented by the general formula (II) defined hereinaove based on the amount of total alcohol components.
申请公布号 EP0902325(A3) 申请公布日期 1999.07.21
申请号 EP19980116358 申请日期 1998.08.28
申请人 FUJI PHOTO FILM CO., LTD. 发明人 AONO, KOICHIRO
分类号 G03F7/021 主分类号 G03F7/021
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