发明名称 |
Photosensitive composition |
摘要 |
A photosensitive composition capable of producing a photosensitive lithographic printing plate having excellent developing property and press life in direct lithoprinting even if stored in an atmosphere having high temperature and humidity. The photosensitive composition comprising a diazo resin (a) wherein a counter anion is an inorganic acid anion or an aliphatic organic acid anion having 3 or less carbon atoms; a diazo resin (b) wherein a counter anion is an aliphatic or aromatic organic acid anion having 6 or more carbon atoms; and a polyurethane resin which is a reaction product of an isocyanate comprising 40 to 90 mol% of a diisocyanate represented by the general formula (I) defined hereinabove based on the amount of total isocyanate components with an alcohol comprising 30 to 90 mol% of a diol represented by the general formula (II) defined hereinaove based on the amount of total alcohol components. |
申请公布号 |
EP0902325(A3) |
申请公布日期 |
1999.07.21 |
申请号 |
EP19980116358 |
申请日期 |
1998.08.28 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
AONO, KOICHIRO |
分类号 |
G03F7/021 |
主分类号 |
G03F7/021 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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