PHOTOSENSITIVE COMPOSITION AND USE THEREOF

摘要

The present invention is related to a photosensitive composition which comprises 70 to 99 weight % of a vinyl polymer (A) comprising recurring units derived from a monomer (a) of the following general formula (1) and 1 to 30 weight % of at least one photosensitive compound (B) selected from the group consisting of azide compounds and diazo compounds. H2C=CH-X-Q Äwherein X is selected from the group consisting of a direct bond, a 1,4-phenylene group, a sulfonyl group, a methylene group, and an alkylene group of 2 to 5 carbon atoms (the methylene and alkylene groups may respectively have one ether, carbonyl, carboxyl, amide or urea group); Q represents a functional group selected from the group consisting of -NH-R, -COCH2COCH3, and -SO2NH2; R represents a residue selected from the group consisting of -CHO, -H (hydrogen), an alkyl group of 1 to 6 carbon atoms (the alkyl group may have one hydroxyl, ether, amino, nitro, cyano, carbonyl, carboxyl, amide, or urea group), -NH2, -N(CH3)2, -COOH, -CONH2 and -CONHCH3Ü