| 摘要 |
PROBLEM TO BE SOLVED: To provide a process for producing such a photomask which obviates a positional error of the projected image of the pattern of the photomask even when the photomask is deformed by its own weight, etc., at the time of use. SOLUTION: A substrate 55 for the photomask is placed atop a substrate holder 51 having an upwardly projecting surface. This substrate holder 51 is fixed into a susceptor 56 and the surface of this susceptor 56 is provided with fixing pins 52A, 52B for downwardly energizing the parts near the opposite two sides of the substrate 55. After the position of the susceptor 56 is set by an X-Y stage 57, the prescribed original plate pattern is drawn on the substrate 55 by means of a writing system 62. The upward deformation quantity of the pattern surface of the substrate 55 is previously set the same as the downward deformation quantity of the pattern surface of the substrate 55 by its own weight of the photomask at the time of the produced photomask is used. |
