| 摘要 |
<p>PROBLEM TO BE SOLVED: To make the surface of a patterned metal film smooth and uniform always in quality in a metal film forming method wherein a patterned metal film is formed by etching, and a resist film is improved in releasability by ashing. SOLUTION: A metal film 6 is formed on a substrate 4a, then a resist 7 of prescribed pattern is formed, the metal film 6 is etched into a patterned metal film 6a using the resist 7 as a mask, the resist is subjected to ashing in an oxygen atmosphere and then separated off, and the patterned metal film 6a is formed on the substrate 4a. In this case, a surface stabilizing process where the etched metal film 6a is exposed to a gaseous atmosphere which contains fluorine ions is provided between an etching process and an ashing process.</p> |
