发明名称 |
SEMICONDUCTOR STRAIN SENSOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor strain sensor having a simple structure and the epitaxial layer region of which is not stained. SOLUTION: A thin strain start section A covers bottom face of a surface- layer region (epitaxial layer region) 31 having a piezoresistance region R and has a covering region 4 exposed on the side of an anti-piezoresistance region. The covering region 4 protects the surface-layer region 31 and the interface of the P-N junction between the surface-layer region 31 and a semiconductor substrate 2 from stains and minute scratches. In order to accurately form the covering region 4 with a sufficient thickness, the etching voltage applied across an electrode faces opposite to the substrate 2 and the surface-layer region 31 is controlled. |
申请公布号 |
JPH11195793(A) |
申请公布日期 |
1999.07.21 |
申请号 |
JP19980293990 |
申请日期 |
1998.10.15 |
申请人 |
DENSO CORP |
发明人 |
FUKADA TAKESHI;YOSHINO YOSHI;SUGITO YASUNARI;SAKAI MINEICHI |
分类号 |
G01L9/04;G01L9/00;H01L21/3063;H01L29/84;(IPC1-7):H01L29/84;H01L21/306 |
主分类号 |
G01L9/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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